debug
{'doi': '10.1049/el:19921069', 'member_id': '265', 'member': 'Institution of Engineering and Technology (IET)', 'container-title': 'Electronics Letters', 'primary-resource': 'http://digital-library.theiet.org/doi/10.1049/el%3A19921069', 'tld': 'theiet.org', 'clearbit-logo': 'https://logo.clearbit.com/theiet.org', 'coaccess': [], 'multiple-resolution': [], 'type': 'JOURNAL ARTICLE', 'published_date': '27 August 1992', 'publication': 'Electronics Letters', 'title': 'Improved Schottky barrier on\n <i>n</i>\n -Sb\n <sub>2</sub>\n S\n <sub>3</sub>\n films chemically deposited with silicotungstic acid', 'name': None, 'id': None, 'location': None, 'display_doi': 'https://doi.org/10.1049/el:19921069', 'grant_info': None, 'grant_info_funders': None, 'grant_info_funder_ids': '', 'grant_info_type': None, 'multiple_lead_investigators': [], 'multiple_co_lead_investigators': [], 'multiple_investigators': [], 'finances': [], 'project_description': None, 'award_amount': None, 'award_start': None, 'funding_scheme': None, 'internal_award_number': None, 'editors': None, 'authors': 'O. Savadogo | K.C. Mandal', 'chairs': None, 'supplementary_ids': '10.1049/el:19921069'}
https://doi.org/10.1049/el:19921069
JSON
XML