Sensitivity of MOS transistor mismatch to device dimensions and suggestions on how to improve matching performance

Publication
IEE Colloquium on `Improving the Efficiency of IC Manufacturing Technology'
Record type
Proceedings article
Published
1995
Authors
S.J. Lovett
DOI
https://doi.org/10.1049/ic:19950933
The publisher of this work supports multiple resolution. The work is available from the following locations:
theiet.org
ieee.org

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https://doi.org/10.1049/ic:19950933
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